Axcelis Introduces the Optima HDx High Current Implanter
BEVERLY, Mass.,
"In today's competitive environment, semiconductor manufacturers are simultaneously challenged with increasing fab productivity, reducing costs as well as meeting the requirements of next generation device manufacturing," said
The new Optima HDx features a unique combination of enhancements to maximize beam current, minimize beam set up time and eradicate energy contamination to deliver the most precise and repeatable performance in the high dose space. The system's unique spot beam technology and short beamline deliver the industry's highest drift beam currents up to 36mA, or 38%, higher than its competitors. To further enhance performance, its patented AutoTune beam tuning system has significantly accelerated both tune times and success rates, providing up to a 60% advantage over competitive systems, for increased fab productivity. Key to the systems enabling technology is the proprietary RadiusScan, which ensures the best across-wafer dose and angle process uniformity, as well as repeatability.
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