Axcelis Launches Revolutionary Ion Source Technology for High Current Implant: New Design Extends Source Life by 300-500%

July 19, 2011 at 8:10 AM EDT
Eterna ELS3 Delivers Unprecedented Cost of Ownership Advantages for Advanced Logic and Memory Applications

BEVERLY, Mass., Jul 19, 2011 (GlobeNewswire via COMTEX) --

Axcelis Technologies, Inc. (Nasdaq:ACLS) today introduced the next generation Eterna ELS (Extended Life Source), the Eterna ELS3. It is designed to deliver unprecedented levels of source life to provide higher tool uptime and significantly lower Optima HDx cost of ownership. Axcelis has a long history of ion source innovation, including the invention of the ELS indirectly heated cathode technology in 1994, which quickly became the industry standard for ion source technology.

Executive Vice President of Engineering and Marketing, Bill Bintz, commented, "Market demand for smaller, more powerful mobile electronics and faster, cheaper devices is driving new technology requirements that leverage Axcelis' core competencies in ion source technology design. In order to meet these challenges, semiconductor manufacturers have placed a higher priority on the use of exotic species and ultra precise implants. The new Eterna ELS3 source includes patent pending hardware and process improvements designed specifically to address these challenges, while simultaneously delivering industry leading cost advantages. The system has already been adopted by our leading edge memory and logic customers and is a key component of their goal to enhance device manufacturability. With this new capability, Axcelis is strongly positioned to advance continued market share gains in high current implant."

With the Eterna ELS3, Axcelis has leveraged its ion source technology expertise to deliver the industry's next generation in source performance for the sub 2Xnm node. The new system extends source life by an unprecedented 500% improvement for Carbon, and a 300% improvement for Germanium applications. The improvement allows for higher uptime due to fewer service intervals. The system is available as an option on new Optima HDx tools, as well as an upgrade to installed systems.

Axcelis Technologies, Inc. (Nasdaq:ACLS) headquartered in Beverly, Massachusetts, provides innovative, high-productivity solutions for the semiconductor industry. Axcelis is dedicated to developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation and cleaning systems. For more information, visit the company's website at: www.axcelis.com.

This news release was distributed by GlobeNewswire, www.globenewswire.com

SOURCE: Axcelis Technologies, Inc. 

CONTACT: Maureen Hart (editorial/media) 978.787.4266
maureen.hart@axcelis.com
Jay Zager (financial community) 978.787.9408
jay.zager@axcelis.com