Axcelis Extends Purion Platform With The Launch Of The Purion XE High Energy Implanter
The Purion Platform enables high yield manufacture of sub 16nm planar and 3-D devices. All Purion implanters incorporate industry leading advanced filtration systems, for unsurpassed beam purity, so even the most sensitive devices are implanted for optimized device performance. The platform's industry leading angle control system and constant focal length scanning deliver the most precise and repeatable dopant placement available today. The scanned spot beam architecture designed into the platform enables control of damage engineering as well as other advanced process enabling implants using materials modification techniques required in leading edge device processes.
The common elements of the Purion platform were designed to drive manufacturing flexibility and lower the total cost of fab operations. Common platform architecture and system options enable ease of process transfer between systems, simplified maintenance, and improved reliability.
The Purion platform redefines next generation implanter technology and performance and enables the efficient production of leading edge semiconductor devices.
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Company Contacts:
Maureen.hart@axcelis.com
jay.zager@axcelis.com
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