Axcelis Introduces Next Generation Purion H™ High Current Implanter
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The Purion H ushers in a revolutionary new era of high performing implant technology, elevating what customers will come to expect from high current implanters. A few of its many new and innovative features include:
- Next generation scanned spot beam technology with precision implant angle and dose control to enhance device performance and yield.
- Enabling process control technology to minimize all forms of contaminants to ensure absolute beam purity.
- Common Purion cross-platform architecture designed to drive manufacturing flexibility and lower the total cost of fab operations.
The Purion Platform
The Purion platform is redefining implanter technology and performance, with each product setting a new benchmark in its respective market. The powerful common platform enables the efficient production of all existing and emerging implant applications across the medium current, high current and high energy space. The scanned spot beam architecture used on all Purion products assures that customers can take full advantage of all current and future advanced process enabling implants, including materials modification techniques required in leading edge device processes. All Purion implanters incorporate
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