Axcelis Announces Sponsorship and Participation in The International Conference on Ion Implantation Technology 2024 in Toyoma, Japan
At the event,
- Performance of an Aluminum Sputtering Source for High Current Doping in Power Devices
- Energetic and Surface Metals Characterization of Purion XEmax With and Without Boost™ Technology Using Vapor Phase Decomposition-Inductively Coupled Plasma Mass Spectrometry
- Radiation Characterization and Mitigation of High Energy H+ Beams
- Wear-Resistant Surface Coatings for Long Electrostatic
Chuck Life and Stable Performance - Self-contained Predictive System Diagnostic Sensors
- Comparison of Arsenic and Antimony Dopant Distribution Profiles of Very High Energy Implantations
- New Challenges and Opportunities in Wide Bandgap Materials with Ion Implantation and Annealing Co-Optimization
- Dual Cathode Ion Source for Axcelis' High Energy Implanters
- Low Metals Ion Source
President and CEO of Axcelis Technologies
For more information on the event, or to register, visit the conference website at https://smartconf.jp/content/iit2024.
About
CONTACTS:
Investor Relations Contact:
Senior Vice President, Investor Relations and Corporate Strategy
Telephone: (978) 787-2352
Email: David.Ryzhik@axcelis.com
Press/Media Relations Contacts:
Senior Director,
Telephone: (978) 787-4266
Email: Maureen.Hart@axcelis.com
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